Center for Materials Research

Spin Coater

WS-650M LAURELL SPIN COATER

 

This spin coater is used to uniformly distribute photoresist by spinning the substrate. Some common materials we use with the spin coater include: positive photoresists (AZ 5214, AZ P4620), SU-8 series negative epoxy-based resists, PZT sol-gel solutions, iron oxide sol-gel solutions, and ProTEK protective coatings.

The maximum speed of the machine is 12,000 rpm and can accomodate sizes between 1/8" and 6" (or 5x5" masks). We have a three different vacuum chucks to handle almost any size sample and have a centering tool to ensure uniform layers.

 

LAURELL 650M MANUAL

 

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Center for Materials Research, PO Box 642711, Washington State University, Pullman, WA, 99164-2711 USA