Center for Materials Research

Rapid Thermal Annealing

Heatpulse 610 Rapid Thermal Processing System

This machine uses high-intensity radiation to heat single wafers for short periods of time.  It has a small chiller coupled to it that allows for extremely precise heating and cooling cycles. The RTA has a wide range of applications from PZT curing with a lead-enriched susceptor to platinum annealing.

 

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Center for Materials Research, PO Box 642711, Washington State University, Pullman, WA, 99164-2711 USA