Center for Materials Research

Atomic Layer Deposition

SAVANNAH S200 ATOMIC LAYER DEPOSITION (ALD)

Our Ultratech ALD machine can deposit a wide variety of films at the atomic level. Films are very conformal even in high-aspect ratio features. The chamber supports up to 8" diameter substrates and a taller lid can accomodate samples as large as 3" tall. Please contact us for a list of materials available!

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Center for Materials Research, PO Box 642711, Washington State University, Pullman, WA, 99164-2711 USA